RF Generator; Application for Further Review of Protest Number 5501-17-100601; machine; semiconductor wafer plasma processing; physical vapor deposition.
Reasoning
RF Generator; Application for Further Review of Protest Number 5501-17-100601; machine; semiconductor wafer plasma processing; physical vapor deposition.
Cite this ruling
CBP Ruling H293625 (84862000): RF Generator; Application for Further Review of Protest Number 5501-17-100601; machine; semiconductor wafer plasma processing; physical vapor deposition.
Paste this into a product's override reason when citing this ruling as justification for a classification.
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