PRD 2809-96-101249; Cluster Tool Ion Beam Deposition System, Ion Beam Deposition Machine; Machine for Applying Aluminum Oxide Film Onto Silicon Wafer Substrate for Later Processing into Read/Write Heads for Computer Disk Drives; Machines for Production of Semiconductor Devices and Electrical Integrated Circuits, Class or Kind, Principal Use, Group Italglass U.S.A. v. U.S.; Electrical Machines and Apparatus, Subheading 8543.30.00
Reasoning
PRD 2809-96-101249; Cluster Tool Ion Beam Deposition System, Ion Beam Deposition Machine; Machine for Applying Aluminum Oxide Film Onto Silicon Wafer Substrate for Later Processing into Read/Write Heads for Computer Disk Drives; Machines for Production of Semiconductor Devices and Electrical Integrated Circuits, Class or Kind, Principal Use, Group Italglass U.S.A. v. U.S.; Electrical Machines and Apparatus, Subheading 8543.30.00
Cite this ruling
CBP Ruling 960562 (84798985): PRD 2809-96-101249; Cluster Tool Ion Beam Deposition System, Ion Beam Deposition Machine; Machine for Applying Aluminum Oxide Film Onto Silicon Wafer Substrate for Later Processing into Read/Write Heads for Computer Disk Drives; Machines for Production of Semiconductor Devices and Electrical Integrated Circuits, Class or Kind, Principal Use, Group Italglass U.S.A. v. U.S.; Electrical Machines and Apparatus, Subheading 8543.30.00
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